Simple Search:

Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication


Citation

Abd.Wahab, Kader Ibrahim (2003) Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication. Masters thesis, Universiti Putra Malaysia.

Abstract / Synopsis

Boron Steam is a process done after boron emitter diffusion for all PNP transistors and diodes. Boron emitter diffusion is a process to dope the emitter well with P-type dopant. The source of this dopant is in the form of liquid spun on the wafers and exposed to high temperatures. Boron steam is done to basically soften the residual liquid boron prior to cleaning for easy removal. This project will cover hardware comparison and recipe proposal that were used. The new consolidated process has resulted in comparable final in-line measurement of oxide thickness and test results. Reliability expectation was also met with 1000 cycles of Intermittent Operating Life test. Significant cost advantages were also achieved.


Download File

[img] PDF
FK_2003_22_A.pdf

Download (859kB)

Additional Metadata

Item Type: Thesis (Masters)
Subject: Boron - Isotopes - Spectra
Subject: Diffusion
Subject: Transistor - Effect of radiation
Call Number: FK 2003 22
Chairman Supervisor: Associate Professor Shamsuddin Sulaiman, PhD
Divisions: Faculty of Engineering
Depositing User: Mohd Nezeri Mohamad
Date Deposited: 15 Jul 2011 11:23
Last Modified: 15 Jul 2011 11:23
URI: http://psasir.upm.edu.my/id/eprint/12163
Statistic Details: View Download Statistic

Actions (login required)

View Item View Item