Abd.Wahab, Kader Ibrahim (2003) Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication. Masters thesis, Universiti Putra Malaysia.
Boron Steam is a process done after boron emitter diffusion for all PNP transistors and diodes. Boron emitter diffusion is a process to dope the emitter well with P-type dopant. The source of this dopant is in the form of liquid spun on the wafers and exposed to high temperatures. Boron steam is done to basically soften the residual liquid boron prior to cleaning for easy removal. This project will cover hardware comparison and recipe proposal that were used. The new consolidated process has resulted in comparable final in-line measurement of oxide thickness and test results. Reliability expectation was also met with 1000 cycles of Intermittent Operating Life test. Significant cost advantages were also achieved.
|Item Type:||Thesis (Masters)|
|Subject:||Boron - Isotopes - Spectra|
|Subject:||Transistor - Effect of radiation|
|Chairman Supervisor:||Associate Professor Shamsuddin Sulaiman, PhD|
|Call Number:||FK 2003 22|
|Faculty or Institute:||Faculty of Engineering|
|Deposited By:||Mohd Nezeri Mohamad|
|Deposited On:||15 Jul 2011 03:23|
|Last Modified:||15 Jul 2011 03:23|
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