Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication

Abd.Wahab, Kader Ibrahim (2003) Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication. Masters thesis, Universiti Putra Malaysia.

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Abstract

Boron Steam is a process done after boron emitter diffusion for all PNP transistors and diodes. Boron emitter diffusion is a process to dope the emitter well with P-type dopant. The source of this dopant is in the form of liquid spun on the wafers and exposed to high temperatures. Boron steam is done to basically soften the residual liquid boron prior to cleaning for easy removal. This project will cover hardware comparison and recipe proposal that were used. The new consolidated process has resulted in comparable final in-line measurement of oxide thickness and test results. Reliability expectation was also met with 1000 cycles of Intermittent Operating Life test. Significant cost advantages were also achieved.

Item Type:Thesis (Masters)
Subject:Boron - Isotopes - Spectra
Subject:Diffusion
Subject:Transistor - Effect of radiation
Chairman Supervisor:Associate Professor Shamsuddin Sulaiman, PhD
Call Number:FK 2003 22
Faculty or Institute:Faculty of Engineering
ID Code:12163
Deposited By: Mohd Nezeri Mohamad
Deposited On:15 Jul 2011 03:23
Last Modified:15 Jul 2011 03:23

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