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Plasma polymerization of silicon-containing monomers


Talib, Zainal Abidin and Kurosawa, Shigeru and Atthoff, Bjorn and Aizawa, Hidenobu and Kashima, Kazuya and Hirokawa, Tomoya and Yoshimi, Yasuo and Yoshimoto, Minoru and Hirotsu, Toshihiro and Miyake, Jun and Hilborn, Jons (2001) Plasma polymerization of silicon-containing monomers. Journal of Photopolymer Science and Technology, 14 (1). pp. 129-138. ISSN 0914-9244; ESSN: 1349-6336


Plasma depositions of ultra thin films from seven silicon-containing liquid monomers were investigated using a continuos wave (CW) plasma source. The deposition rate of plasma polymerized films were determined using a quartz crystal microbalance (QCM) technique while the film composition were determined spectroscopiclly using primarily X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared method (FT-IR). The wettability of the plasma-polymerized films was also investigated by measuring the contact angles of water on the film surfaces. It was observed that the C=C absorption band was not present in these films. This observation is consistent with selective polymerization through the double bond. Oxygen was present in all samples investigated and this may be attributed to the quenching of radicals in the film by reactions with oxygen when exposed to atmosphere.

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Additional Metadata

Item Type: Article
Divisions: Faculty of Science
DOI Number: https://doi.org/10.2494/photopolymer.14.129
Publisher: The Society of Photopolymer Science and Technology
Keywords: Plasma polymerization; Silicon-containing monomers; Deposition rate; Quartz crystal microbalance (QCM); XPS
Depositing User: Nabilah Mustapa
Date Deposited: 10 Oct 2016 05:38
Last Modified: 10 Oct 2016 05:38
Altmetrics: http://www.altmetric.com/details.php?domain=psasir.upm.edu.my&doi=10.2494/photopolymer.14.129
URI: http://psasir.upm.edu.my/id/eprint/48661
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