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A method for depositing tin oxide film.


Citation

Wan Md. Zin Wan Yunus (2011) A method for depositing tin oxide film. PI2011001802.

Abstract / Synopsis

The present invention relates to a method for depositing tin oxide film on a substrate comprises of providing a substrate; preparing a precursor solution comprises of metal dichloride, hydrogen peroxide and a complexing agent; adjusting the precursor solution at a predetermined pH; maintaining the precursor solution at a predetermined temperature; immersing; and drying the substrate. The tin oxide film is deposited on the substrate by chemical bath deposition at a room temperature.


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Additional Metadata

Item Type: Patent
Application Number: PI2011001802
Filing Date: 2011-04-21
Divisions: Faculty of Science
Keywords: Tin oxide film.
Depositing User: Suzila Mohamad Kasim
Date Deposited: 16 Oct 2014 11:20
Last Modified: 16 Oct 2014 11:20
URI: http://psasir.upm.edu.my/id/eprint/32117
Statistic Details: View Download Statistic

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