Characterization of thermal, optical and carrier transport properties of porous silicon using the photoacoustic technique

Chan, Kok Sheng and Mat Yunus, W. Mahmood and Wan Yunus, Wan Md Zin and Talib, Zainal Abidin and Kassim, Anuar (2008) Characterization of thermal, optical and carrier transport properties of porous silicon using the photoacoustic technique. Physica B, 403 (17). pp. 2634-2638. ISSN 0921-4526

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Official URL: http://dx.doi.org/10.1016/j.physb.2008.01.029

Abstract

In this work, the porous silicon layer was prepared by the electrochemical anodization etching process on n-type and p-type silicon wafers. The formation of the porous layer has been identified by photoluminescence and SEM measurements. The optical absorption,energy gap, carrier transport and thermal properties of n-type and p-type porous silicon layers were investigated by analyzing the experimental data from photoacoustic measurements. The values of thermal diffusivity, energy gap and carrier transport properties have been found to be porosity-dependent. The energy band gap of n-type and p-type porous silicon layers was higher than the energy band gap obtained for silicon substrate (1.11 eV). In the range of porosity (50–76%) of the studies, our results found that the optical band-gap energy of p-type porous silicon (1.80–2.00 eV) was higher than that of the n-type porous silicon layer (1.70–1.86 eV). The thermal diffusivity value of the n-type porous layer was found to be higher than that of the p-type and both were observed to increase linearly with increasing layer porosity.

Item Type:Article
Keyword:Porous silicon, Photoacoustic, Energy gap, Thermal properties
Faculty or Institute:Faculty of Science
Publisher:Elsevier
DOI Number:10.1016/j.physb.2008.01.029
ID Code:6025
Deposited By: Najwani Amir Sariffudin
Deposited On:07 May 2010 07:15
Last Modified:22 Jul 2010 12:55

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