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Aerosol-assisted chemical vapor deposition of metal oxide thin films for photoelectrochemical water splitting


Citation

Ariffin, Siti Normaimunah and Lim, Hong Ngee and Talib, Zainal Abidin and Pandikumar, Alagarsamy and Huang, Nay Ming (2015) Aerosol-assisted chemical vapor deposition of metal oxide thin films for photoelectrochemical water splitting. International Journal of Hydrogen Energy, 40 (1). pp. 2115-2131. ISSN 0360-3199; ESSN: 1879-3487

Abstract / Synopsis

Hydrogen energy has emerged as an alternative energy source. There are many processes for hydrogen production, which include both reforming and non-reforming hydrogen production. This paper reviews the benefits of photoelectrochemical (PEC) water splitting as a promising method for the production of hydrogen. Consequently, fabrication of efficient photoelectrode is crucial to achieve high performance cells. Aerosol-assisted chemical vapor deposition (AACVD) is discussed as a promising fabrication method for the materialization of thin films in terms of their homogeneity and uniformity. From this perspective, we discuss the AACVD process and the influence of the deposition parameters on PEC water splitting.


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Additional Metadata

Item Type: Article
Divisions: Faculty of Science
Institute of Advanced Technology
DOI Number: 10.1016/j.ijhydene.2014.11.131
Publisher: Elsevier
Keywords: AACVD; Metal oxide; Thin film; Photoelectrochemical cells; Water splitting; Hydrogen production
Depositing User: Mohd Hafiz Che Mahasan
Date Deposited: 08 Aug 2016 12:53
Last Modified: 08 Aug 2016 12:53
Altmetrics: http://www.altmetric.com/details.php?domain=psasir.upm.edu.my&doi=10.1016/j.ijhydene.2014.11.131
URI: http://psasir.upm.edu.my/id/eprint/43672
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