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A method for depositing tin oxide film.

Wan Md. Zin Wan Yunus. (2011) A method for depositing tin oxide film.

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Abstract

The present invention relates to a method for depositing tin oxide film on a substrate comprises of providing a substrate; preparing a precursor solution comprises of metal dichloride, hydrogen peroxide and a complexing agent; adjusting the precursor solution at a predetermined pH; maintaining the precursor solution at a predetermined temperature; immersing; and drying the substrate. The tin oxide film is deposited on the substrate by chemical bath deposition at a room temperature.

Item Type:Patent
Keyword:Tin oxide film.
Faculty or Institute:Faculty of Science
Application Number:PI2011001802
Filing Date:2011-04-21
ID Code:32117
Deposited By: Suzila Mohamad Kasim
Deposited On:16 Oct 2014 11:20
Last Modified:16 Oct 2014 11:20

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